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Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019

24th February 2019   -   28th February 2019
San Jose, California, United States
https://spie.org/AL/conferencedetails/novel-patterning-technologies?SSO=1
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Abstract

The Novel Patterning conference showcases novel lithography and patterning techniques that provide solutions for semiconductor IC nodes, wafer-level packaging, and non-IC related technologies such as MEMS/NEMS, MOEMS, displays, photonics, metamaterials, and micro/nanofluidics, including roll-to-roll, 3D printing, and additive manufacturing.

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