Abstract

The conference is an open forum for discussion of major challenges in current and emerging technologies related to the tools and processes for ion implantation, annealing of semiconductors and non-semiconductors, implanted devices, metrology of implanted layers and devices, as well as methods related to ion implantation. The conference offers an excellent opportunity for engineers and researchers in industry, research institutes, and universities to present new results and to discuss ideas of new applications of ion implantation. The conference comprises a wide range of topics, from fundamental research to industrial applications and equipment.