Remarkable improvement in low temperature performance of model three-way catalysts through solution atomic layer deposition

Remarkable improvement in low temperature performance of model three-way catalysts through solution atomic layer deposition

Improving the performance of commercial three-way catalysts like rhodium on alumina is a major challenge considering the limited design space allowed for such systems. Now, solution atomic layer deposition is used to incorporate titania or zirconia promoters into this catalyst, leading to remarkable improvements in its overall performance.

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